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ASTM F 1709 : 1997 : R2016
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  • ASTM F 1709 : 1997 : R2016

ASTM F 1709 : 1997 : R2016

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ASTM F 1709 : 1997 : R2016 Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2023)

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CONTAINED IN VOL. 10.04, 2016 Defines pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.

R00001283
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